| 摘要 |
PURPOSE: A controller of a semiconductor process chamber is provided to be capable of minimizing the damage of a device due to foreign substance by removing polymers generated at the lateral wall of the chamber using RF(Radio Frequency) power, and improving productivity by prolonging a wet cleaning cycle. CONSTITUTION: A controller of a semiconductor process chamber is provided with a plurality of electrodes(110) installed at both inner sidewalls of the chamber, an RF power generator(120) for generating RF power, and a matching circuit(130) connected between the electrode and the RF power generator for supplying the RF power generated from the RF power generator to the electrode. Preferably, the controller further includes a heating line(30) installed at the lateral wall of the chamber and a heat exchanging part(20) for circulating warm water through the heating line.
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