发明名称 METAL WIRE PHOTOLITHOGRAPHY PROCESS BY USING ALUMINUM METAL
摘要 PURPOSE: A metal wire photolithography process by using aluminum metals is provided to reduce the number of processes and TAT(Turn Around Time) and to save the cost of materials. CONSTITUTION: In a process for patterning an aluminum metal such as pure aluminum or an aluminum alloy, a material for collectively removing the aluminum metal(122) and a photoresist material(124) is used for the rework of a photolithography process. The photolithography process includes the processes of exposure, development and etching by using the photoresist. Herein, the material for collectively removing the aluminum metal and photoresist contains 5wt%-40wt% of mono ethanol amine and 2wt%-10wt% of tetra methyl ammonium hydroxide.
申请公布号 KR20030056253(A) 申请公布日期 2003.07.04
申请号 KR20010086428 申请日期 2001.12.27
申请人 LG.PHILIPS LCD CO., LTD. 发明人 KIM, MYEONG JUN;LEE, HYEONG CHAN
分类号 G02F1/136;(IPC1-7):G02F1/136 主分类号 G02F1/136
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