发明名称 |
METAL WIRE PHOTOLITHOGRAPHY PROCESS BY USING ALUMINUM METAL |
摘要 |
PURPOSE: A metal wire photolithography process by using aluminum metals is provided to reduce the number of processes and TAT(Turn Around Time) and to save the cost of materials. CONSTITUTION: In a process for patterning an aluminum metal such as pure aluminum or an aluminum alloy, a material for collectively removing the aluminum metal(122) and a photoresist material(124) is used for the rework of a photolithography process. The photolithography process includes the processes of exposure, development and etching by using the photoresist. Herein, the material for collectively removing the aluminum metal and photoresist contains 5wt%-40wt% of mono ethanol amine and 2wt%-10wt% of tetra methyl ammonium hydroxide.
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申请公布号 |
KR20030056253(A) |
申请公布日期 |
2003.07.04 |
申请号 |
KR20010086428 |
申请日期 |
2001.12.27 |
申请人 |
LG.PHILIPS LCD CO., LTD. |
发明人 |
KIM, MYEONG JUN;LEE, HYEONG CHAN |
分类号 |
G02F1/136;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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