| 摘要 |
<p>An air platen assembly is described and includes a platen(140) that has a plurality of concentric rings(164). Each of the rings has a plurality of openings(144) in order to provide a cushion of air to a CMP belt(102). At least one of the rings extends beyond an outer edge(166) of a wafer(116) to be planarized by the CMP belt(102). A support(136) is attached with the platen and has a plurality of air ports for pressurized air to pass to the rings of the platen. A gasket(138) is positioned between the support(136) and the platen(140) and has a plurality of cutouts that align with the openings and the air ports. A base(134) is also included and supports the support(136).</p> |
