发明名称 Seal ring structure for radio frequency integrated circuits
摘要 Described is a method wherein a seal ring is formed by patterning multiple layers each comprised of a dielectric layer with conductive vias covered by a conductive layer. Discontinuities are made in the seal ring encapsulating an integrated circuit. There are no overlaps between different sections of the seal ring thereby reducing coupling of high frequency circuits in the seal ring structures. In addition, the distance between signal pads, circuits and the seal ring are enlarged. Electrical connection is made between deep N-wells and the seal ring. This encapsulates the integrated circuit substrate and reduces signal coupling with the substrate.
申请公布号 US2003122235(A1) 申请公布日期 2003.07.03
申请号 US20030370345 申请日期 2003.02.19
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY 发明人 TSAI CHAO-CHIEH;WONG SHIH CHIH
分类号 H01L21/00;H01L21/44;H01L21/48;H01L21/50;H01L23/02;H01L23/552;H01L23/58;(IPC1-7):H01L23/02 主分类号 H01L21/00
代理机构 代理人
主权项
地址