发明名称 METHOD FOR EVALUATING ELECTROLYTIC PLATING SOLUTION
摘要 PROBLEM TO BE SOLVED: To provide a method for evaluating whether or not a given electrolytic plating solution is a one that can form an electrolytically plated film of a desired shape. SOLUTION: The method is the one for evaluating an electrolytic plating solution used when a thin film conductor layer is formed on the surface of a substrate having a recessed resin layer and an electrolytically plated film is formed on the thin film conductor layer, and comprises immersing the substrate having the formed thin film conductor layer in an electrolytic plating solution, applying an alternating current between both ends of the thin film conductor layer to measure electrical characteristics, and evaluating the shape of the electrolytically plated film to be formed from the electrical characteristics. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003183883(A) 申请公布日期 2003.07.03
申请号 JP20010381175 申请日期 2001.12.14
申请人 IBIDEN CO LTD 发明人 NAKAI TORU
分类号 G01N27/02;C25D7/00;C25D21/12;H05K3/00;H05K3/46;(IPC1-7):C25D7/00 主分类号 G01N27/02
代理机构 代理人
主权项
地址