SPIN DRYER FOR SEMICONDUCTOR WAFER

摘要

PURPOSE: A spin drier for semiconductor wafer is provided to prevent the generation of stripy particles on a wafer due to the ionized water by forming a slope portion at an extension portion of a wafer guide. CONSTITUTION: A spin drier includes a wafer guide(20) and a lifter. The wafer guide includes a support portion(21) and an extension portion(22) extended from the support portion in order to support a wafer. The lifter includes a nozzle plate, a slot formed on the nozzle plate, and a nitrogen gas outlet in order to support a lower portion of the lifter in a loading process and an unloading process of a wafer. A corner portion(25) is formed by the support portion and the extension portion of the wafer guide. A slope portion(26) is formed at the extension portion in order to form an internal angle of the corner portion as an obtuse angle. An insertion hole is formed at a lower end of the inside of a chamber. The lifter is inserted into the insertion hole.