发明名称 |
METHOD AND APPARATUS FOR PATTERNING A WORKPIECE |
摘要 |
The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arranged in said computer controlled reticle according to a digital description. An image of said computer controlled reticle is created on said workpiece, wherein said pixels in said computer controlled reticle are arranged in alternate states along at least a part of one feature edge in order to create a smaller address grid. The invention also relates to an apparatus for creating a pattern on a workpiece. The invention also relates to a semiconducting wafer and a mask. |
申请公布号 |
AU2002359127(A1) |
申请公布日期 |
2003.06.30 |
申请号 |
AU20020359127 |
申请日期 |
2002.12.11 |
申请人 |
MICRONIC LASER SYSTEMS AB |
发明人 |
TORBJORN SANDSTROM |
分类号 |
G03F1/68;G03F7/20;H01L21/02;H01L21/027;H04N1/036;H04N1/04;H04N1/17 |
主分类号 |
G03F1/68 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|