| 摘要 |
PROBLEM TO BE SOLVED: To identify the location where a fault is generated and moreover detect situation change of the power feeding system in the course of operation to form a film. SOLUTION: The plasma CVD apparatus comprises a gas supply source 25 to supply the material gas to a reaction vessel 4 to generate plasma 28 therein, a high frequency power supply 1, a unit 13 to detect physical mass of high frequency power source, a measuring line 12 for electrically connecting the internal electrical system of the reaction vessel 4 and the unit 13, and a supply line 8 to electrically connect the electrical system within the reaction vessel 4 and the high frequency power supply 1. The electrical system is provided with a discharge electrode 5 to generate plasma of the material gas. The measuring line 12 and supply 8 are mutually connected to their electrical systems. The unit 13 calculates the spatial location of a local fault of the electrical system, obtains the spacial distance of a fault generating location, and determines the location where an electrical fault is generated based on the travelling high frequency power of the supply line 8 supplied to the electrical system from the high frequency power supply 1 and the physical mall of the reflected high frequency power of the measuring line 12. COPYRIGHT: (C)2003,JPO
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