| 摘要 |
PROBLEM TO BE SOLVED: To provide a quality evaluation method of a mirror-finished and chamfered wafer for accurately evaluating the quality of a mirror-finished and chamfered surface. SOLUTION: An alkaline etching liquid is used for the chamfered surface of mirror-finished silicon wafer W for etching by 1.5μm, thus selectively etching a side line existing on the chamfered surface, various kinds of scratches, and recessed defects such as machining damage in PCR, amplifying even a fine recessed defect that cannot be detected by the conventional wafer edge defect automatic inspection apparatus to a size that can be detected as a pit P, and more accurately evaluating the quality of the mirror-finished and chamfered wafer W. COPYRIGHT: (C)2003,JPO
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