| 摘要 |
PURPOSE: A method for forming uniform patterns of a semiconductor device is provided to improve alignment by aligning a reticle using a lens controller. CONSTITUTION: The first pattern(5) is formed on a wafer(1) by using the first mask. At this time, the exposure magnification is identified by using an alignment mark, such as a vernier(4). The second pattern(6) overlapped with the first pattern is formed by exposing using the second mask after the exposure magnification changes by using a lens controller.
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