| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin-film magnetic head capable of performing high- aspect ratio patterning with high accuracy and realizing higher recording density. <P>SOLUTION: A lower shield 2, a magnet-resistive head 6, an upper shield 3, a light gap layer 9, etc., are deposited and formed on an Al-Tic substrate 1 and thereafter a magnetic thin-film 13 of NiFe, etc., which is a base for plating is formed on the layer 9 and a chemical amplification negative type resist 14 provided with transmittance to a KrF excimer laser beam of preferably 80% or above is applied onto this thin-film 13. The resist 14 is then irradiated with the KrF excimer laser beam across a Levenson type phase shift mask 100 and is immersed into an alkaline developing solution, by which an opening pattern 14a is formed on the resist 14. A magnetic film 15 of CoNiFe, etc., to provide a magnetic pole 11 for writing is then formed by a plating method in this opening pattern 14a. <P>COPYRIGHT: (C)2003,JPO |
