| 摘要 |
To provide an electron beam drawing apparatus capable of drawing the grating pitch of a fine diffraction grating pattern highly precisely. An objective lens is constructed of lenses of two stages, and an object deflector is disposed over the objective lens of the lower stage. The power of the objective lens of the lower stage is changed to change the deflection width of the object deflector, and the power of the objective lens of the upper stage is changed to form the image on a sample plane thereby to make a focusing.
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