摘要 |
<p>A method of fabricating a vertical cavity surface emitting laser comprising the steps of epitaxially growing a first DBR (104) positioned on a substrate (102) wherein the first DBR is epitaxially grown using MOCVD. The substrate is orientated in an off-axis crystallographic direction which increases the radiative efficiency. A first cladding layer (106) is positioned on the first DBR and to an active region (108) is epitaxially grown on the first cladding layer wherein the active region is epitaxially grown using plasma assisted MBE. A second DBR (112) is epitaxially grown on the second cladding layer (110) wherein the second DBR is epitaxially grown using MOCVD. The active region is epitaxially grown using plasma assisted MBE to increase the mole fraction of nitrogen 'N' incorporation. The DBR's are grown using MOCVD to improve the electrical performance.</p> |