发明名称 PLASMA PROCESSOR
摘要 A plasma processor with a microwave generating source mounted integrally on a shield lid by miniaturizing a matching circuit. The plasma processor is characterized by comprising a evacuatable processing vessel (42), a workpiece mount base (44) provided in the processing vessel, a microwave transmitting plate (70) provided in the opening section of the top of the processing vessel, a plane antenna member (74) for supplying a microwave into the processing vessel via the microwave transmitting plate, a shield lid (78) so grounded as to cover the top of the plane antenna member, a waveguide (82) for guiding the microwave from a microwave generating source to the plane antenna member, a member elevating mechanism (85) for relatively varying the vertical distance between the plane antenna member and the shield lid, a tuning rod (104) so provided insertably into the waveguide tube, a tuning rod drive mechanism (102) so moving the tuning rod as to adjust its insert amount, and a matching control section (114) for matching adjustment by controlling the elevation amount of the antenna member and the insert amount of the tuning rod.
申请公布号 WO03052807(A1) 申请公布日期 2003.06.26
申请号 WO2002JP12279 申请日期 2002.11.25
申请人 TOKYO ELECTRON LIMITED;KASAI, SHIGERU;YAMAMOTO, NOBUHIKO;ADACHI, HIKARU;OSADA, YUKI 发明人 KASAI, SHIGERU;YAMAMOTO, NOBUHIKO;ADACHI, HIKARU;OSADA, YUKI
分类号 H05H1/46;C23C16/511;H01J37/32;H01L21/205;H01P5/103;(IPC1-7):H01L21/31;H01L21/302;H01P5/00;H01J27/16;H01J37/08;C23F4/00 主分类号 H05H1/46
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