| 摘要 |
PURPOSE: A pattern structure is provided to be capable of detecting and estimating the corrosion of a metal line in real time by forming a comb type or serpentine type micro pattern at a peripheral portion of a relatively large pattern. CONSTITUTION: A pattern structure(20) is provided with the first pattern(20a) having a relatively large size and the second pattern(20b) having a relatively small size formed at the peripheral portion of the first pattern(20a). At this time, the second pattern(20b) capable of electrically measuring the extent of corrosion generated at the second pattern(20b) under a CMP(Chemical Mechanical Polishing) process, has a predetermined length(l) and pitch(p). Preferably, the second pattern(20b) is shaped as a comb or a serpent.
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