SHOWERHEAD FOR CHEMICAL VAPOR REACTOR

摘要

PURPOSE: A showerhead for chemical vapor reactor in which a source is uniformly emitted from an outlet of the showerhead is provided. CONSTITUTION: The showerhead(100) for chemical vapor reactor is characterized in that first, second and third circular plates(110,120,150) are sequentially laid up and formed in such a way that the side surface of the first, second and third circular plates is sealed, at least two of 'n' source injection holes(114) arranged on a concentric circle separated from the central axis in a certain distance with the 'n' source injection holes being spaced apart from each other in an equal gap, and a reaction gas injection hole(112) penetrating the first circular plate are formed on the first circular plate, a reaction gas passing hole(122) corresponding to the reaction gas injection hole, and 'n' sectors uniformly split centering around the source injection holes are formed on the second circular plate, first groove(126) formed with respectively spaced apart from the central axis and outer circumference in a certain distance at a line extended to the source injection holes from the central axis, a plurality of second grooves(128) formed with extended from the first groove to a position that is spaced apart from a boundary line of the sectors in a certain distance, and a plurality of source dispersion holes(130) at the lower part of the second grooves are formed in the sectors, and a source passing hole(152) formed correspondingly to the source dispersion holes so that a source passing the source dispersion holes passes through the third circular plate, third groove(154) separated from the source passing hole in a certain distance and opened to the reaction gas injection hole so that the third groove becomes a diffusion path of the reaction gas, and a plurality of reaction gas injection holes at the lower part of the third groove are formed on the third circular plate.