| 发明名称 |
METHOD OF PRODUCING OXIDE THIN FILM AND PRODUCTION SYSTEM THEREFOR |
| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that impurities are easy to remain in an oxide thin film deposited as a demerit by an ALD process while having the most of the merits therein. SOLUTION: In the method of producing the oxide thin film by heating a surface-treated substrate, allowing an oxide deposition raw material to adsorb or deposit on the surface and performing the deposition of an oxide, the oxide thin film is produced by using water. COPYRIGHT: (C)2003,JPO
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| 申请公布号 |
JP2003176109(A) |
申请公布日期 |
2003.06.24 |
| 申请号 |
JP20010377102 |
申请日期 |
2001.12.11 |
| 申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
YASUDA TETSUJI;NISHIZAWA MASAYASU;YAMAZAKI SATOSHI |
| 分类号 |
C01B13/14;C01B13/32;C01B33/12;C23C8/02;C23C8/16;C23C26/00;C23C30/00;H01L21/314;H01L21/316;H01L29/78;(IPC1-7):C01B13/14 |
主分类号 |
C01B13/14 |
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