| 摘要 |
An optical waveguide device having a large difference in specific refractive index and manufacturing method therefor. An embedded silicon oxide layer of a Silicon on Insulator substrate is used as an under cladding 102, a core 103 is formed by processing the silicon layer of this Silicon on Insulator substrate, and an upper cladding 104 is formed by depositing a silicon oxide film on the surface of the Silicon on Insulator substrate. Because the difference in refractive index between silicon and silicon oxide is large, it is possible to achieve an optical waveguide with a large difference in specific refractive index. As a result of increasing the difference in specific refractive index of an optical waveguide, a smaller and lower-cost optical circuit can be achieved. In addition, because a Silicon on Insulator substrate is used, the number of manufacturing processes can be reduced.
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