发明名称 Substrate processing apparatus and substrate processing method
摘要 A substrate processing apparatus includes a rotation accommodating shelf and a transfer machine. The rotation accommodating shelf is capable of accommodating a plurality of accommodating containers in which substrates are to be loaded. The transfer machine is for transferring the plurality of accommodating containers to the rotation accommodating shelf. The plurality of accommodating containers are respectively disposed on radial lines, which radiate from a rotation center of the rotation accommodating shelf, such that each accommodating container is respectively inclined in a horizontal plane in a same fixed direction with respect to a radial line.
申请公布号 US6582174(B1) 申请公布日期 2003.06.24
申请号 US20000491491 申请日期 2000.01.25
申请人 KOKUSAI ELECTRIC CO., LTD. 发明人 HAYASHI AKINARI
分类号 H01L21/68;H01L21/677;(IPC1-7):H01L21/68 主分类号 H01L21/68
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