发明名称 MEASURING INSTRUMENT UTILIZING ATTENUATED TOTAL REFLECTION
摘要 PROBLEM TO BE SOLVED: To obtain high S/N measurement data by means of a measuring instrument, such as the surface plasmon resonance measuring instrument, etc., utilizing attenuated total reflection. SOLUTION: When a dielectric block 11 constituting a measuring chip 10 is formed as one block having incident and emitting surfaces 11b and 11c for a measuring light beam 30, one surface 11a on which a thin film layer 12 is formed, and a resin introducing gate at a position facing a mold surface controlling the surface 11a by injection molding a resin, the block 11 is positioned so that the passing positions of the light beam 30 on the incident and emitting surfaces 11b and 11c of the block 11 may be separated from the end face 11e of the block 11 on the resin introducing gate side by≥1 mm at the time of performing the injection molding. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003172693(A) 申请公布日期 2003.06.20
申请号 JP20010372325 申请日期 2001.12.06
申请人 FUJI PHOTO OPTICAL CO LTD 发明人 KUBO TAKASHI;NOMURA TAKAMITSU
分类号 G01N21/03;B29C45/26;B29L11/00;G01N21/01;G01N21/13;G01N21/27;G01N35/04;G01N35/10;(IPC1-7):G01N21/27 主分类号 G01N21/03
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