发明名称 VACUUM-TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a vacuum-treating device that can reduce volume and types of required refrigerants. SOLUTION: This vacuum-treating device 100 is provided with an aluminum susceptor 104 on which an object W to be treated is placed, a vacuum vessel chamber 101 which is positioned near immediately under the object W and has a refrigerant channel 111 through which a refrigerant which absorbs heat of the susceptor 104 flows, and a U-shaped refrigerant circuit 114 one end of which is connected to the entrance of the channel 111 and the other end of which is connected to the exit of the channel 111. The device 100 is also provided with a propane gas enclosed in the refrigerant circuit 114 and a chiller 102 having a compressor 115 which cools the propane gas heated in the circuit 114 by gas expansion. This device 100 circulates the propane gas in the refrigerant circuit 114. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003174016(A) 申请公布日期 2003.06.20
申请号 JP20010374045 申请日期 2001.12.07
申请人 TOKYO ELECTRON LTD 发明人 KAWAGUCHI SEIKYU;KOBAYASHI ATSUSHI
分类号 H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/302
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