METHOD FOR FABRICATING ANALYZING SAMPLE OF TRANSMISSION ELECTRON MICROSCOPE

摘要

PURPOSE: A method for fabricating an analyzing sample of a transmission electron microscope is provided to minimize the damage of the analyzing sample due to ion beams by burying gap regions between material layer patterns. CONSTITUTION: A protective layer material(110) is coated on an upper surface of a semiconductor substrate formed with material layer patterns(220) in order to fill gap regions(230) between the material layer patterns. A thermal process for the semiconductor substrate including the protective layer material is performed. A protective layer is formed on the upper surface of the semiconductor substrate by hardening the protective layer material. A semiconductor substrate section(104) including an analyzing region is prepared by cutting the semiconductor substrate. The semiconductor substrate section is etched by using the focus ion beam. The analyzing pattern including the analysis region is formed.