发明名称 FUSE STRUCTURE OF SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A fuse structure of a semiconductor device is provided to prevent the capacity of a metal oxide semiconductor(MOS) transistor from being deteriorated by making melted metal residue remain in the vicinity of an upper metal layer separated from the MOS transistor by quite a distance. CONSTITUTION: The fuse structure(100) is electrically connected with other metal layers via holes in a dielectric layer(10). The metal layer has higher resistivity so as to become an ideal fuse structure. The shape of metal layer is narrow at end wide in middle to form a narrow channel, so as to reduce the fusing current.
申请公布号 KR20030047815(A) 申请公布日期 2003.06.18
申请号 KR20020077589 申请日期 2002.12.07
申请人 UNITED RADIOTEK INC. 发明人 JOU CHEWNPU
分类号 H01L27/02;H01L23/525;(IPC1-7):H01L27/02 主分类号 H01L27/02
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