| 摘要 |
<p>PURPOSE: A quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter, and a procedure for manufacture of the quartz glass blank are provided. CONSTITUTION: In a quartz glass blank for an optical component for transmission of ultraviolet radiation with a wavelength of 250 nm or shorter, the quartz glass blank is characterized by a glass structure that is essentially free of oxygen defect sites, an H2-content in the range of 0.1x10¬16 molecules/cm¬3 to 4.0x10¬16 molecules/cm¬3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5x10¬16 molecules/cm¬3, a refractive index inhomogeneity,Δn, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm, wherein OH-content of the quartz glass blank is in the range of 200 wt-ppm to 350 wt-ppm. The use of a quartz glass blank for the manufacture of a component for use in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter is characterized in that a quartz glass is selected for a given pulse number, P, the quartz glass possessing a minimal hydrogen content, C(H2min), and a maximal hydrogen content, C(H2max), both of which comply with the following dimensioning rules: C(H2min)£molecules/cm¬3|=1.0x10¬6xε¬2xP, and C(H2max)£molecules/cm¬3|=2.0x10¬18xε, (ε=pulse energy density, in mJ/cm¬2).</p> |
