发明名称 Thin-film transistor and its manufacturing method
摘要 The present invention provides, in a TFT, a gate electrode and a channel domain that are plurally divided in the channel-length direction, a low-concentration domain that is formed between the divided channel domains, and a low-concentration drain domain that adjoins a second channel domain located closest to a drain domain side among the divided channel domains. Therefore, even if the impurity concentration is relatively high in the low-concentration domain located between the divided channel domains and a low-concentration drain domain, an abnormal increase of drain current in the saturated region can be prevented, and a TFT with a high drain current level can be obtained. Thus, the present invention provides a TFT and its manufacturing method where abnormal increase of drain current in the saturated region can be prevented and the drain current level in the saturated region is sufficiently high.
申请公布号 US6580129(B2) 申请公布日期 2003.06.17
申请号 US20010914914 申请日期 2001.12.13
申请人 SEIKO EPSON CORPORATION 发明人 LUI BASIL;MIGLIORATO PIERO;YUDASAKA ICHIO;MIYASAKA MITSUTOSHI
分类号 H01L29/423;H01L21/336;H01L29/41;H01L29/786;(IPC1-7):H01L29/00 主分类号 H01L29/423
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