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发明名称
INTERMETAL DIELECTRIC LAYER FOR INTEGRATED CIRCUITS
摘要
申请公布号
SG96590(A1)
申请公布日期
2003.06.16
申请号
SG20000007417
申请日期
2000.12.13
申请人
CHARTERED SEMICONDUCTOR MANUFACTURING LTD;LUCENT TECHNOLOGIES INC
发明人
HUANG LIU;JOHN SUDIJONO;TAN JUAN BOON;EDWIN GOH;ALAN CUTHBERTSON;ARTHUR ANG;CHEN FENG
分类号
H01L21/316;H01L21/768;(IPC1-7):H01L21/476
主分类号
H01L21/316
代理机构
代理人
主权项
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