| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus, a method and a program for the measurement of irregularities in a film thickness wherein when the film thickness of a thin film during a production process is controlled, the film thickness can be measured wholly with high accuracy in an on-line manner. <P>SOLUTION: A sample is imaged, an R signal, a G signal and a B signal are acquired (S201), and the level difference between the R signal and the B signal is found at each pixel in the direction of a film width (S203). A projection computing operation is performed (S205), and the moving average of a projection computed value is found (S207). A differential computing operation in the direction of the film width is performed (S209), and whether the irregularities in the film thickness exist or not is decided (S213) on the basis of a value obtained by computing (S211) the difference between the maximum value and the minimum value of differentiated values in a prescribed section. Lastly, whether a measurement has been performed on the whole face of the sample is decided (S215), and the above steps are continued until the whole face is measured. <P>COPYRIGHT: (C)2003,JPO |
