| 摘要 |
PURPOSE: A process solution circulation apparatus of wet etching equipment is provided to be capable of removing air bubble generated in a circulation line by using a buffer tank having an exhaust port. CONSTITUTION: A process solution circulation apparatus is provided with an inner tub(112), an outer tub(114), and a circulation line(122) connected between the inner and outer tub(112,114). The circulation line(122) further includes a pump(124) for pumping a process solution, a filter(126) for removing foreign substance, and an air bubble removing part. The air bubble removing part is further includes a buffer tank(130) for storing the process solution, a process solution inflow port(134) located at the lower portion of the buffer tank(130), a process solution outflow port(136) located at the upper portion of the buffer tank(130), an exhaust port(138) located at the upper portion of the buffer tank(130) for removing air bubbles filled in the buffer tank(130), and a drain line(139) connected with the exhaust port(138).
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