发明名称 Method for purifying semiconductor gases
摘要 This invention is directed a method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a) passing the impure liquefied gas through a first adsorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b) passing the first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c) passing the second purified gas through a second adsorption means to remove impurities from the vapor phase therein to produce the ultra-high purity gas.
申请公布号 US6576138(B2) 申请公布日期 2003.06.10
申请号 US20000735802 申请日期 2000.12.14
申请人 PRAXAIR TECHNOLOGY, INC. 发明人 SATERIA SALIM;HOLMER ARTHUR EDWARD;SHREWSBURY RONALD WILLIAM
分类号 B01D15/00;B01D53/26;B01D53/28;C01B21/04;C01B23/00;C01C1/02;F25J3/06;F25J3/08;(IPC1-7):B01D15/00 主分类号 B01D15/00
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