| 发明名称 |
DEVICE FOR TREATING WASTE WATER CONTAINING GALLIUM |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device for treating waste water containing gallium which treats the waste water containing gallium discharged from a manufacture factory of compound semiconductor wafers, a manufacture factory of devices or the like and can efficiently collect gallium as a rare and valuable metal with high concentration from the waste water having low concentration of gallium although the amount of the waste water is large. <P>SOLUTION: The device for treating waste water containing gallium is equipped with a membrane separating means to concentrate gallium in the waste water containing gallium and with a gallium adsorbing means where the concentrated water by the membrane separating means is introduced and the gallium in the concentrated water is adsorbed. <P>COPYRIGHT: (C)2003,JPO</p> |
| 申请公布号 |
JP2003164863(A) |
申请公布日期 |
2003.06.10 |
| 申请号 |
JP20010366454 |
申请日期 |
2001.11.30 |
| 申请人 |
KURITA WATER IND LTD |
发明人 |
MATSUMOTO AKIRA;HAYASHI KAZUKI |
| 分类号 |
B01D61/02;B01D61/14;B01D61/58;B01D71/02;C02F1/28;C02F1/44;C02F1/70;C22B3/24;C22B7/00;C22B9/02;C22B30/04;C22B58/00;(IPC1-7):C02F1/28 |
主分类号 |
B01D61/02 |
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