| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a discharge plasma processing method which can accurately control introduction of a process gas between electrodes, and an apparatus therefor. <P>SOLUTION: The processing method for introducing a raw process gas inbetween a pair of electrodes, of which the opposing surface of at least one electrode is coated with a solid dielectric, and processing a substrate to be treated with the plasma provided by means of applying an electric field inbetween the electrodes, is characterized by introducing the raw process gas between the electrodes, through at least two flow-rate control units arranged in parallel. <P>COPYRIGHT: (C)2003,JPO |
