| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for inspecting a phase shift mask, which never detects a false defect of a pattern as a pattern defect by mistake when a pattern defect of the phase shift mask is inspected. <P>SOLUTION: The correlation with deformation of the pattern of the phase shift mask due to the difference in light intensity between a shifter part and a non-shifter part of the phase shift mask by waveguide effect is stored in a rule base. Namely, the correlation between the pitch of the pattern and correction quantities (bias quantity) of the line width and length of the shifter part is assumed and put in a table. According to the pitch of the pattern, a correction quantity is calculated by using the rule base to correct data for pattern inspection and then data for phase shift mask correspondence inspection. Then image data of an inspection image obtained by a pattern defect inspecting device with inspection wavelength is compared and contrasted with the data for phase shift mask correspondence inspection to detect a pattern defect. <P>COPYRIGHT: (C)2003,JPO</p> |
