发明名称 BURNER FOR A VAPOUR DEPOSITION PROCESS
摘要 <p>A burner (1) for a vapour deposition process has a cylindrical central gas passage (100) and a plurality of external gas passages (200, 300, 400) surrounding the central gas passage (100), and comprises a back block (2) defining an initial section of said gas passages, a face block (3) defining a final section of said gas passages and a manifold plate (4) positioned between the back block and the face block and defining an intermediate section of said external gas passages; the face block, the manifold plate and the back block comprise inner integral walls that define respective sections of the central gas passage.</p>
申请公布号 WO2003045860(A1) 申请公布日期 2003.06.05
申请号 EP2001013701 申请日期 2001.11.26
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址