PLASMA PROCESSING SYSTEM

摘要

A low−cost plasma processing system in which reproducibility and stability can be enhanced while reducing power loss. The plasma processing system (1) comprises a main body (2) and an incidental equipment (3). The incidental equipment (3) comprises a power supply unit (5) for supplying power to a process chamber (4), and a plurality of dry pumps (6, 7). The power supply unit (5) comprises a matching unit (9), a high frequency amplifier (13) connected with the matching unit (9) through a coaxial cable (24), and a power control section (12) incorporating a DC amplifier (14). The high frequency amplifier (13) is disposed independently and remotely from the DC amplifier (14) in the vicinity of the matching unit (9)and connected with the DC amplifier (14) through an ordinary cable (25).