发明名称 Verfahren zur Herstellung von Oberflächenwellenanordnungen für Endflächenreflektionen
摘要 The object of the invention is to to provide a manufacturing method for a surface wave device of an end-face reflection type which is favorable in a resonant characteristic with less possibility of occurrence of chipping. The method comprises forming an IDT (12) on a piezoelectric plate (11), and cutting the piezoelectric plate (11) in a direction which is parallel to the outermost electrode fingers of the IDT within a target area which extends from the out edges of the outermost electrodes to a position lambda /8 outwardly therefrom, lambda being the wavelength of the surface wave generated by the IDT, so as to form opposite end faces of the surface wave device. <IMAGE>
申请公布号 DE69627757(D1) 申请公布日期 2003.06.05
申请号 DE1996627757 申请日期 1996.06.28
申请人 MURATA MFG. CO., LTD. 发明人 KADOTA, MICHIO;MIZOGUCHI, NAOKI
分类号 H03H3/08;H03H9/02;H03H9/145;H03H9/25;(IPC1-7):H03H3/08 主分类号 H03H3/08
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