发明名称 |
Verfahren zur Herstellung von Oberflächenwellenanordnungen für Endflächenreflektionen |
摘要 |
The object of the invention is to to provide a manufacturing method for a surface wave device of an end-face reflection type which is favorable in a resonant characteristic with less possibility of occurrence of chipping. The method comprises forming an IDT (12) on a piezoelectric plate (11), and cutting the piezoelectric plate (11) in a direction which is parallel to the outermost electrode fingers of the IDT within a target area which extends from the out edges of the outermost electrodes to a position lambda /8 outwardly therefrom, lambda being the wavelength of the surface wave generated by the IDT, so as to form opposite end faces of the surface wave device. <IMAGE> |
申请公布号 |
DE69627757(D1) |
申请公布日期 |
2003.06.05 |
申请号 |
DE1996627757 |
申请日期 |
1996.06.28 |
申请人 |
MURATA MFG. CO., LTD. |
发明人 |
KADOTA, MICHIO;MIZOGUCHI, NAOKI |
分类号 |
H03H3/08;H03H9/02;H03H9/145;H03H9/25;(IPC1-7):H03H3/08 |
主分类号 |
H03H3/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|