发明名称 OPTICAL PROFILOMETRY OF ADDITIONAL-MATERIAL DEVIATIONS IN A PERIODIC GRATING
摘要 Disclosed is a method and system for measurement of periodic gratings which have deviations which result in more than two materials occurring along at least one line in the periodic direction. A periodic grating is divided into a plurality of hypothetical layers, each hypothetical layer having a normal vector orthogonal to the direction of periodicity, each hypothetical layer having a single material within any line parallel to the normal vector, and at least one of the hypothetical layers having at least three materials along a line in the direction of periodicity. A harmonic expansion of the permittivity is in or inverse permittivity 1/is in is performed along the direction of periodicity for each of the layers including the layer which includes the first, second and third materials. Fourier space electromagnetic equations are then set up in each of the layers using the harmonic expansion of the permittivity is in or inverse permittivity 1/is in, and Fourier components of electric and magnetic fields in each layer. The Fourier space electromagnetic equations are then coupled based on boundary conditions between the layers, and solved to provide the calculated diffraction spectrum.
申请公布号 US2003103218(A1) 申请公布日期 2003.06.05
申请号 US20010007124 申请日期 2001.12.04
申请人 NIU XINHUI;JAKATDAR NICKHIL 发明人 NIU XINHUI;JAKATDAR NICKHIL
分类号 G02B27/42;(IPC1-7):G01B11/02 主分类号 G02B27/42
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