| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
Providing grayscales by simultaneously projecting two or more patterned projection beams onto the substrate, each of which has a different pattern and a different intensity <IMAGE> |
| 申请公布号 |
EP1316850(A1) |
申请公布日期 |
2003.06.04 |
| 申请号 |
EP20020258182 |
申请日期 |
2002.11.27 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER MAST, KAREL DIEDERICK |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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