发明名称 Photo-cured dental pit and fissure sealant composition for caries prevention
摘要 The invention relates to a photo-cured dental pit and fissure sealant composition for caries prevention: i) based on the multifunctional prepolymer mixture of 2,2-bis-(4-(2-hydroxy-3-methacryloyloxypropoxy)phenyl)propane ("Bis-GMA"), which has conventionally been used as dental pit and fissure sealant for caries prevention, and a multifunctional prepolymer formed by substituting hydrogen atoms in hydroxyl group with methacrylate groups in the Bis-GMA molecules; and ii) comprising a diluent, an inorganic filler, a photoinitiation system, and other additives. The dental pit and fissure sealant composition of the present invention is based on a multifunctional prepolymer mixture and has better physical and mechanical properties and biocompatibility than a conventional composition based on Bis-GMA only.
申请公布号 US6573312(B2) 申请公布日期 2003.06.03
申请号 US20000749878 申请日期 2000.12.29
申请人 DENTKIST CO. LTD.;KOREA INST SCI & TECH 发明人 HAN DONG-KEUN;AHN KWANG-DUK;JEONG JIN-HEE
分类号 A61C13/00;A61K6/08;A61K6/083;C08F2/46;C08K5/08;C08K5/17;C08L33/06;C09D4/00;(IPC1-7):A61K6/083;C08J3/28 主分类号 A61C13/00
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