| 发明名称 |
Dewatered CMP polishing compositions and methods for using same |
| 摘要 |
A dry solids composition is provided which may be reconstituted into a chemical-mechanical polishing composition comprising no abrasive particles.
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| 申请公布号 |
US6572449(B2) |
申请公布日期 |
2003.06.03 |
| 申请号 |
US20010836915 |
申请日期 |
2001.04.18 |
| 申请人 |
RODEL HOLDINGS, INC. |
发明人 |
RHOADES ROBERT L.;YANCEY PAUL J. |
| 分类号 |
B24B37/04;B24B57/02;C09G1/02;H01L21/321;(IPC1-7):B24B1/00 |
主分类号 |
B24B37/04 |
| 代理机构 |
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