PHOTOMASK FOR ABERRATION MEASUREMENT, ABERRATION MEASURING METHOD, INSTRUMENT FOR ABERRATION MEASUREMENT, AND MANUFACTURING METHOD FOR THE INSTRUMENT

摘要

PURPOSE: To provide a photmask for aberration measurement which makes it possible to measure an aberration of a lens with small trouble by subdividing a field, an aberration measuring method, an instrument for aberration measurement, and a manufacturing method for the instrument. CONSTITUTION: The photomask 5 for aberration measurement is equipped with a substrate 1 which transmits exposure light, a plurality of opening patterns 2a for measurement which are formed on the top surface of the substrate in a plurality of measurement pattern formation areas, a shading film 3 which is formed on the reverse surface of the substrate 1 in the measurement pattern formation area and has a reverse-surface opening pattern 3a for making substantially different the angles of incidence of the exposure light on the plurality of opening patterns 2a for measurement, and a plurality of reference patterns 2b which are formed on the top surface of the substrate 1 in one or more reference pattern formation areas; and the reverse surface of the substrate 1 in the reference pattern formation areas has substantially the same angles of incidence of exposure light on the plurality of reference patterns 2b.