发明名称 |
PATTERN FORMATION METHOD AND SYSTEM USING ELECTROSTATIC FORCE |
摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method and system using electrostatic force capable of forming the pattern for a high-quality fluorescent film in PDP and an electrode or the like through easy processes. SOLUTION: The method has an application step of applying pattern formation material particles 1 which have been made effective and charged with electricity. In this step, pattern formation material particles 1A having a small particle diameter is applied, thereafter applying pattern formation material particles 1B having a large particle diameter. Next, the pattern is fixed on a panel substrate.
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申请公布号 |
JP2003158363(A) |
申请公布日期 |
2003.05.30 |
申请号 |
JP20010356056 |
申请日期 |
2001.11.21 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KOMYOJI DAIDO;MATSUDA NAOKO;NAKA HIROYUKI;FUKANO AKIRA;AIZAWA MASAHIRO |
分类号 |
G02F1/13;H05K3/10;H05K3/12;(IPC1-7):H05K3/10 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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