发明名称 PATTERN FORMATION METHOD AND SYSTEM USING ELECTROSTATIC FORCE
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method and system using electrostatic force capable of forming the pattern for a high-quality fluorescent film in PDP and an electrode or the like through easy processes. SOLUTION: The method has an application step of applying pattern formation material particles 1 which have been made effective and charged with electricity. In this step, pattern formation material particles 1A having a small particle diameter is applied, thereafter applying pattern formation material particles 1B having a large particle diameter. Next, the pattern is fixed on a panel substrate.
申请公布号 JP2003158363(A) 申请公布日期 2003.05.30
申请号 JP20010356056 申请日期 2001.11.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KOMYOJI DAIDO;MATSUDA NAOKO;NAKA HIROYUKI;FUKANO AKIRA;AIZAWA MASAHIRO
分类号 G02F1/13;H05K3/10;H05K3/12;(IPC1-7):H05K3/10 主分类号 G02F1/13
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