发明名称 FORMING METHOD OF RESIST PATTERN, WIRING FORMING METHOD AND ELECTRONIC COMPONENT
摘要 PROBLEM TO BE SOLVED: To provide a forming method of a resist pattern wherein a sectional form is an overhang type, resistance to heat is high, and easy elimination by organic solvent is enabled after thermal load is applied, and to provide a wiring forming method using the forming method of a resist pattern, and an electronic component provided with a metal wiring formed by using the wiring forming method. SOLUTION: On a substrate 1, a first resist layer 11 is formed which can be dissolved by developer for a second resist layer 12 and has resistance to heat and strippability. On the first resist layer 11, a second resist layer 12 is formed which is composed of photoresist having resistance to heat. After exposure, the second resist layer 12 on the upper layer side is developed by using developer, and the first resist layer 11 on the lower layer side is etched, thereby forming an overhang type pattern.
申请公布号 JP2003158062(A) 申请公布日期 2003.05.30
申请号 JP20010357430 申请日期 2001.11.22
申请人 MURATA MFG CO LTD 发明人 OE HIDEAKI;HAGI TOSHIO
分类号 G03F7/26;G03F7/40;H01L21/027;H01L21/28;H01L21/306;H01L21/3205;(IPC1-7):H01L21/027;H01L21/320 主分类号 G03F7/26
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