发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To prevent byproducts from being deposited near a furnace port without laying a heater. SOLUTION: On an upper surface of a seal cap 23 of a furnace port opening/ closing device 21 for opening and closing the furnace port 16 of a mainfold 15 of a process tube 11, a shower head 30 for blowing gaseous nitrogen 52 like a shower is installed. In supplying a film formation gas 51, when the gaseous nitrogen 52 is blown off like a shower from the shower head 30, a gaseous nitrogen atmosphere 53 as a byproduct preventing gas atmosphere is formed in an area above the seal cap 23, the film formation gas 51 is blocked from being in contact with a surface of a processing chamber side end face area of the seal cap 23, and thus the byproducts are prevented from being deposited on the area. Thus, since deposition of the byproducts near the furnace port is prevented, generation of particles due to peeling of a deposited film is prevented and a manufacture yield or the like is improved. Since the need of laying the heater is eliminated, a load lock chamber can be constructed for a boat carry-in/carry-away chamber.
申请公布号 JP2003158081(A) 申请公布日期 2003.05.30
申请号 JP20010357382 申请日期 2001.11.22
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 TSURI MAKOTO;YONEMITSU SHUJI;KAKIZAKI SATOSHI
分类号 C23C16/44;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/44
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