发明名称 Semiconductor device having an indium doped dielectric layer located therein and a method of manufacture therefor
摘要 The present invention provides a semiconductor device, a method of manufacture therefor, and an integrated circuit including the semiconductor device. The semiconductor device includes a semiconductor substrate and an indium doped dielectric layer located over the semiconductor substrate.
申请公布号 US2003100195(A1) 申请公布日期 2003.05.29
申请号 US20010997650 申请日期 2001.11.28
申请人 AGERE SYSTEMS INC. 发明人 DUNCAN JULIA C.;MINFORD WILLIAM J.;OSENBACH JOHN W.
分类号 H01L21/314;H01L21/316;H01L21/322;H01L21/8238;H01L23/31;H01L27/092;(IPC1-7):H01L21/31;H01L21/469 主分类号 H01L21/314
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