发明名称 Method of making a single-deposition-layer-metal dynamic random access memory
摘要 A 16 megabit (224) or greater density single deposition layer metal Dynamic Random Access Memory (DRAM) part is described which allows for a die that fits within an industry-standard 300 ml wide SOJ (Small Outline J-wing) package or a TSOP (Thin, Small Outline Package) with little or no speed loss over previous double metal deposition layered 16 megabit DRAM designs. This is accomplished using a die architecture which allows for a single metal layer signal path, together with the novel use of a lead frame to remove a substantial portion of the power busing from the die, allowing for a smaller, speed-optimized DRAM. The use of a single deposition layer metal results in lower production costs, and shorter production time.
申请公布号 US6569727(B1) 申请公布日期 2003.05.27
申请号 US19970852909 申请日期 1997.05.08
申请人 MICRON TECHNOLOGY, INC. 发明人 CASPER STEPHEN L.;ALLEN TIMOTHY J.;DURCAN D. MARK;SHIRLEY BRIAN M.;RHODES HOWARD E.
分类号 G11C11/401;H01L23/50;H01L23/528;H01L27/10;(IPC1-7):H01L21/824 主分类号 G11C11/401
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