SUBSTRATE PROCESSING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing unit, apparatus and method which can increase processing efficiency and space use efficiency. SOLUTION: In a substrate processing unit 11, a means for driving an exposure head 23a of an exposure apparatus 23 in X and Y directions and a means for driving an optical head 24a of the apparatus 23 are obtained by a single XY driving mechanism 25. Thereby the single XY driving mechanism 25 can two-dimensionally move the illumination position of exposing light on a substrate W and a film thickness measuring position thereof.