| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a transparent conductive film with superior sliding resistance preventing detachment and peeling of a transparent conductive film from a high polymer film. SOLUTION: The transparent conductive film includes the high polymer film and the transparent conducting film, preferably an ITO film comprising metallic oxide provided on the high polymer film by a gaseous phase film forming method. The transparent conducting film comprises a first transparent conducting film 4 comprising the metallic oxide and a second transparent conducting film 5 comprising the metallic oxide provided on the first transparent conducting film 4. Film forming conditions of the second transparent conducting film is different from film forming conditions of the first transparent conducting film. For example, they are formed by differentiating an oxygen percentage content, a nitrogen percentage content, a crystal state and/or a surface shape, a pressure during sputtering, a film forming speed or the like.
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