| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which is capable of efficiently conducting both liquid processing and processing with a liquid, such as cleaning after the liquid processing. SOLUTION: By connecting side parts 40 of a process liquid bath to the bottom 30 of a process liquid bath 30, where a substrate is held, a liquid processing by a process liquid can be applied to the substrate. By connecting a cover 60 to a processing liquid bath 50 for forming a liquid path and supply a liquid, processing (such as cleaning and drying) of the substrate by a liquid can be conducted efficiently, without taking the substrate out of the processing bath.
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