ACHROMATIC FRESNEL OPTICS BASED LITHOGRAPHY FOR SHORT WAVELENGTH ELECTROMAGNETIC RADIATIONS
摘要
A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.
申请公布号
WO03042760(A2)
申请公布日期
2003.05.22
申请号
WO2002US35514
申请日期
2002.11.05
申请人
XRADIA, INC.;YUN, WENBING;WANG,YUXIN;NILL, KENNETH, W.