Anlage zur Niederdruck-Plasmabehandlung

摘要

The invention relates to an installation for low-pressure plasma processing of powdered and/or granulated material, comprising a treatment reactor, a mixing device fitted in the processing reactor, as well as devices allocated to the processing reactor for the production/activation of a plasma. This installation is characterized in that the mixing device (20) is formed by a mixer (36), which is arranged inside a stationary processing reactor (12) which receives the material that is to be processed, and which is stored in galvanic isolation.